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To regain the integrity of the skin is to act simultaneously on hydration, epidermal reconstruction and protection against the damage caused by free radicals. Rich in madecassoside, a powerful antioxidant, this formulation blocks the irritation process, soothes and optimises the natural ability of skin recovery, in the stage following cosmetic procedures or after sun exposure.
MADECASSOSIDE : PURE EXTRACT OF CENTELLA ASIATICA: Improves the organisation of the epidermis. It restores the moisture balance and blocks free radicals.
GLYCYRRHETINIC ACID: Reduces skin inflammation.
Experts in dermatological peels, we have channelled our technology into a radiance mask formulation that is exfoliating and retexturing. Its fast-acting formula revitalises and plumps dull and tired skin, smoothes irregular texture with imperfections, boosts radiance and redefines an ideal skin texture.
Glycolic acid: Skin-renewing, exfoliating, it renews and smoothes the epidermis.
Soya isoflavones: Stimulate the skin's natural repair system and activate its regeneration capacity.
Sensitive skin needs soothing moisturising comfort. In a rich, nourishing cream, this high-tolerance treatment rebalances, plumps and gently protects the skin.
ENOXOLONE: 18 ß glycyrrhetinic acid, also known as ENOXOLONE, is an active ingredient that is known to soothe skin irritations.
